加入支持让我们有继续维护的动力！会员畅享查看所有预告
立即购买
Steve Shu: EUV ptychographic nano meteorology
- 来源：
- 学校官网
- 收录时间：
- 2025-01-19 13:27:10
- 时间：
- 2025-01-12 15:00:00
- 地点：
- 科技楼516报告厅
- 报告人：
- Steve Shu
- 学校：
- -/-
- 关键词：
- nano devices, quantum devices, 3D structure, interface quality, chemical composition, extreme ultraviolet imaging, reflectometer, phase stability, ptychography
- 简介：
- Next-generation nano- and quantum devices have increasingly complex 3D structure. As the dimensions of these devices shrink to the nanoscale, their performance is often governed by interface quality or precise chemical or dopant composition. Here, we present the first phase-sensitive extreme ultraviolet imaging reflectometer. It combines the excellent phase stability of coherent high-harmonic sources, the unique chemical sensitivity of extreme ultraviolet reflectometry, and state-of-the-art ptychography imaging algorithms.
- -/- 184
报告介绍：
Next-generation nano- and quantum devices have increasingly complex 3D structure. As the dimensions of these devices shrink to the nanoscale, their performance is often governed by interface quality or precise chemical or dopant composition. Here, we present the first phase-sensitive extreme ultraviolet imaging reflectometer. It combines the excellent phase stability of coherent high-harmonic sources, the unique chemical sensitivity of extreme ultraviolet reflectometry, and state-of-the-art ptychography imaging algorithms.
报告人介绍：
Steve Shu is an Associate Professor at the School of Electrical and Computer Engineering in The University of Sydney. He received his B. Eng degree from Shanghai Jiaotong University in 2002, M.Eng from Nanyang Technological University in 2004, and Ph.D from The University of Melbourne in 2007, all in electrical and electronic engineering. Before returning to academia, he had worked more than a decade in the microelectronics industry (e.g., microelectronics research institute IMEC, the world's leading semiconductor equipment supplier ASML in Netherlands).
购买下会员支持下吧...用爱发电已经很久了 立即购买
